Scientific applications

Study of interfaces and surfaces at air or under ultra high vacuum by X-ray scattering techniques

Source characteristics

Bending magnet - see  Characteristics of bending magnet source BM32 at ESRF

source size

less than 0.3x0.1 mm2 (HxV) FWHM
vert. source divergence 0.13 mrad at 20 keV
total horiz.ang.acceptance 2.8 mrad


Optical Hutch

 From right to left (X-ray beam travel direction):                                                                                              attenuator and slits (HxV)

                                                                                                                                                     mirror 1


                                                                                     mirror 2

       micrometric slits (pink beam mode)


Optics (monochromatic mode)

optical elements mirror 1 double-crystal
mirror 2
distance from source 26 m 28 m 30 m
focusing type vert.collim.or foc.
vert. foc.
working angle 0-7 mrad 0-25 deg. 0-10 mrad
beam size at sample position (1:1) : 0.5x0.3 mm2 (HxV)
spectral range 7-30 keV
energy resolution in E/E  0.5x10-4 for Si(311)
 2x10-4 for Si(111)
flux at sample  5x1011 ph s-1(10-4 rbw, 0.1 A at 20 keV)


Optics (pink beam mode)


optical elements mirror 1 mirror 2 secondary
two Kirkpatrick-Baez (Pt) mirrors
distance from source 26 m 30 m 35 m 60 m
Optical function vert. foc.
vert. foc.
20X20 µm2 vert.+horiz. foc.
working angle 3.65mrad 3.65 mrad   2.9 mrad
beam size at sample 0.5x0.7 µm2 (HxV) FWHM
pink beam spectral range 5-25 keV
estimated flux at sample approx. 10^11 photons/sec in standard monochromatic conditions


Three instruments:

INS: In Situ Nanostructures and Surfaces (UHV)

GMT: Multipurpose goniometer

MicroDiff: Laue Microdiffraction setup