UHV system

UHV system (including In-Situ Chamber)

Temperature:100 K - 2300 K

Resolution: vertical axis 6.5nm, horizontal axis 5nm, rotation bragg 0.2µrad, tild 1.5µrad, vertical axis 1 °

Sample: thin films

Xray-technique: grazing incidence nuclear resonance and x-ray scattering, small-angle scattering

Storage of prepared samples under UHV conditions; Load-lock system for transfer of samples under UHV conditions;

Provision to adapt other equipment as e.g. a transportation chamber to the system.

UHV system with the In-Situ Chamber