Beamline Layout Diagram

The beamline comprises one optics hutch (OH1), one experiments hutch (EH1) and several control hutches for experiments control, sample preparation, meetings, mechanical workshop (beamline staff only!) and storage.

Source

The source device is a cryogenically cooled permanent magnet undulator (CPMU) with period 16.4mm, Bo=3.14 T and alpha=1.111. The minimum gap for user operation is 5mm

Optics

The beamline optics are organized in blocks.

Optics hutch:

  • Block 1: Primary slits
  • Block 2: Double Multilayer Monochromator (DMM)
  • Block 3: Secondary slits and beam profile monitor
  • Block 4: Channel cut crystal monochromator (Si 111)
  • Block 5: Transfocator (2D diamond lenses)
  • Block 6: Secondary slits and beam profile monitor
  • Safety shutter

Experiments hutch:

  • Block 7: Secondary slits and beam profile monitor

End Station

The principal elements of the end station in EH1 are the Dark Field Microscopy Bench and the Far Field Detector Frame.

Dark Field Microscopy Bench

  • Incident beam module
    Decoherer
    Secondary Slits
    Ion Chamber beam intensity monitor
    Fast shutter
  • Main block
    • Condenser module
    • Sample environment gantry
    • Sample goniometer
    • Near field camera module
    • Objective module
    • Diffraction camera module
  • Auxiliary gantry

Far Field Detector Frame

  • Far Field Camera
    Optique Peter TwinMic high resolution detector with 10x and 2x objectives, pco.edge 4.2 Bi sCMOS detector
  • Reciprocal Space Camera
    Basler camera with video objective, scintillator screen.

Detectors

  • Near Field Camera
  • Diffraction Camera
  • Far Field Camera
  • Reciprocal Space Camera

Sample Environments

  • Furnace (T < 1100 - deg C), see Lesage et al. (2026) A high-temperature furnace for multimodal synchrotron-based X-ray microscopy and diffraction imaging J. Synchrotron Rad. 33, 115. DOI: 10.1107/S1600577525010288
  • Gas blower furnace (pool)
  • LN2 jet cryostat (pool)