ID26 is an insertion device source consisting of three mechanically independent undulators (two 35-mm and one revolving 35/27-mm period each 1.6m long).

Optics

Element
Description 
HDM1 Water-cooled 620 mm long flat mirror. Each mirror of the beamline has three different coatings (Pt, Si and Pd) for efficient harmonic rejection.
Kohzu Monochromator Cryogenically-cooled fixed-exit double-crystal monochromator
Monochromator crystals Flat Si[111] pair and Flat Si[311] pair
Energy range 2.4 - 30 keV
Intrinsic resolution (DE/E) Si[111]: 1.4 x 10-4  Si[311]: 0.3 x 10-4
Horizontal KB mirror 1000 mm long mirror with benders for horizontal focalization at 37.2m from source
Vertical KB mirror 600 mm long mirror with benders for vertical focalization at 39.1m from source
Flux at sample > 1013 ph/sec using Si(111) monochromator. Flux factor 5 less for Si(311)
Beam size 100 x 50 micron2 in EH1 at 43m from source, 200 x 100 micron2 in EH2 at 54.6m from source

Detectors

The following options are available for X-ray absorption and emission experiments. experiments:

  • An emission spectrometer using five spherical analyzer crystals for energies 4.5 - 17 keV (DE/E < 0.001).
  • An emission spectrometer using 11 cylindrical analyzer crystals for energies down to 2 keV (DE/E < 0.001)
  • Photo-diodes for flux monitoring and for experiments with absorber concentrations above 1mM.
  • Single element Si drift diode dector.
  • Avalanche Photodiode (APD).

Available Scanning Modes

  • X-ray absorption spectra with continuous scanning of undulator gap to minimize radiation damage to the samples.

Further details are given in the page on Scanning Modes

Sample Environment

Low temperature measurements can be performed by means of a displex cryostat with the sample in vacuum. Temperatures down to ~10 K can be obtained using He as cryogen. A mass flow control system for gases that is controlled by the beamline computer is available. Please visit the sample environment web page for more possibilities (Sample Environment Support Service).